Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1989-03-17
1991-10-08
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20429805, C23C 1408
Patent
active
050551698
ABSTRACT:
In a reactive ion plating process utilizing radio frequency power, the rate of evaporation of a noble metal such as ruthenium or iridium, the rate of evaporation of a valve metal such as titanium, and the partial oxygen pressure are adjusted to produce electrically conductive mixed metal oxide ceramic coating on a valve metal substrate. The noble metal constitutes 10-20 percent of the metal atoms in the coating. The coated substrate can sustain 150 amperes per square meter of exposed coating surface in fresh water electrolyte for at least 20 hours, and preferably at least 75 hours, without an excessive increase in the voltage level required to maintain that current density.
REFERENCES:
patent: 3632498 (1972-01-01), Beer
patent: 3840443 (1974-10-01), Beer
patent: 3948751 (1976-04-01), Bianchi et al.
J. J. Bessot, New Vacuum Deposition Techniques, Metal Finishing, Mar. 1980, p. 21-26, Apr. 1980, p. 63-66.
Goode et al., Ion plating, Vacuum, vol. 29, No. 1, Jan. 1979, pp. 9-11, 143-14,
B. Chapman, Glow Discharge Processes, John Wiley & Sons, New York, 1980, pp. 139-153.
Kumar et al., Ceramic Coated Anode for Cathodic Protection, Materials Performance, (Jun. 1984), pp. 24-28.
Badawy et al., "Kinetics of the Dissolution Behaviour of Anode Oxide Films on Niobium in NaOH Solutions", Journal of Applied Electrochemistry, 17 (1987), pp. 559-566.
Salvador et al., "Photoelectronic Properties of a Ti.sub.0.97 Ru.sub.0.03 Biphase Crystal in an Aqueous Electrolyte", Mat. Res. Bull., vol. 19, pp. 643-648, 1984.
Gautron et al., "Reduction and Doping of Semiconductor Rutile (TiO.sub.2)", Mat. Res. Bul-, vol. 16, pp. 575-580, 1981.
Korczynski et al., "Studies on the Durability of Platinum and Ruthenium Oxide Coated Titanium Anodes in the D-Ribono-y-Lactone Electro-Reduction Proceess", Corrosion Science, vol. 21, No. 5, pp. 329-332, 1981.
Moulton, "Information Sources for Electrochemistry", Jour. of Applied Electrochemistry 16 (1986) 1-7.
Verwey et al., "Controlled Valency Semiconductors", Philips Res. Rep. 5., 173-187, 1950.
Tuller, "Highly Conductive Ceramics".
Wilson, "The Theory of Metals", Chapter V Semiconductors, Cambridge Press, 1953.
Smits, "Measurement of Sheet Resistivities with the Four-Point Probe". Bell Systems Tech. Jour., May 1958.
Wold et al., "Unusual Electronic Properties of Defect and Substituted Oxides with the Rutile Structure", Final Report U.S. Army Contract NHo. DAAG46-83-Koo15, Mar. 1987.
Hock et al., "Structure, Chemistry, and Properties of Mixed Metal Oxides", National Assoc. of Corrosion Engineers proceeding from the 1988 National Meeting in St. Louis, Mo., Mar. 21-25, 1988, Paper No. 230.
Givens John H.
Hock, Jr. Vincent F.
Rigsbee James M.
Suarez Joseph E.
Hollis Darrell E.
Leader William T.
Niebling John F.
The United States of America as represented by the Secretary of
LandOfFree
Method of making mixed metal oxide coated substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making mixed metal oxide coated substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making mixed metal oxide coated substrates will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-255449