Rotatable substrate supporting mechanism with temperature sensin

Details Rotatable substrate supporting mechanism with temperature sensin Rotatable substrate supporting mechanism with temperature sensin

1995-08-10

1999-05-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118730, 118500, C23C16/00

Patent

active

059024070

ABSTRACT:
A rotatable substrate supporting mechanism for use in a chemical vapor deposition reaction chamber of the type used in producing semi-conductor devices is provided with a susceptor for supporting a single substrate, or wafer, for rotation about an axis normal to the center of the wafer. The mechanism is provided with a temperature sensing system for producing signals indicative of sensed temperatures taken at the center of the susceptor and at various points about the periphery thereof. A gas purging system is provided for inhibiting the flow of reactant gas in unwanted areas of the reaction chamber and in the supporting system itself. Rotational driving of the mechanism is accomplished by a variable speed motor under control of a circuit which stops and starts the rotation at controlled speeds and stops the rotation at a home position for enhancing the handling of the wafers.

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IBM Technical Disclosure Bulletin. vol. 21. No. 10, pp. 4086-4087. Mar. 1979.

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