Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-02-15
1992-05-12
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429811, C23C 1434
Patent
active
051124670
ABSTRACT:
A cathode sputtering apparatus provided with a quick disconnect mechanism for rapid replacement of a target. The quick disconnect mechanism preferably includes a rotatable sleeve that upon appropriate rotation exerts a clamping force on the target. The clamping force preferably is created by balls caused to cam radially outward from a central axis.
REFERENCES:
patent: 4169031 (1979-09-01), Brors
patent: 4515675 (1985-05-01), Kieser et al.
patent: 4564435 (1986-01-01), Wickersham
patent: 4668373 (1987-05-01), Rille et al.
patent: 4820106 (1989-04-01), Walde et al.
patent: 4820397 (1989-04-01), Fielder et al.
Leybold Aktiengesellschaft
Weisstuch Aaron
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