Process and apparatus for igniting an ultra-high frequency ion s

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source

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315 39, 313230, 31323131, H05H 1300

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048599093

ABSTRACT:
A process for igniting a ultra-high frequency ion source using in a per se known manner, a resonator cavity supplied by a gas or a vapor of a material for forming a plasma, a system for injecting ultra-high frequency power into the cavity and a system for extracting ions of the plasma outside of the cavity, said process comprising the steps of forming the cavity to be of the multimode type, producing nucleating electrons within the medium to be ionized and preserving the plasma following its ignition solely by ultra-high frequency power. Apparatus for igniting an ultra-high frequency ion source using the process is also disclosed.

REFERENCES:
patent: 3778656 (1973-12-01), Fremot et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4598231 (1986-07-01), Matsuda et al.
Nuclear Instruments & Methods In Physics Research, vol. 196, No. 2/3, May 1982, pp. 325-329.
Applied Physics Letters, vol. 44, No. 4, Feb. 1984, pp. 396-398.
Revue De Physique Appliquee, vol. 12, No. 10, Oct. 1977, pp. 1655-1661.

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