Super submicron electron beam writer

Details Super submicron electron beam writer Super submicron electron beam writer

1987-01-02

1989-01-17

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3730

Patent

active

047989599

ABSTRACT:
A demagnified image of an array of electron emitters is focused by an electron optics lens onto a substrate. The image of the array is scanned to draw a number of patterns, corresponding to the number of emitters, on the substrate. The image is also moved in a step - and - repeat manner to draw patterns over a larger portion of the substrate than can be covered by one emitter array image.

REFERENCES:
patent: 3875416 (1975-04-01), Spicer
patent: 4151420 (1979-04-01), Keller et al.
patent: 4298803 (1981-11-01), Matsuura
patent: 4418283 (1983-11-01), Trotel
Nanometrics, "Nanoletter", vol. 2, No. 2, May 1983.

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