Chemical apparatus and process disinfecting – deodorizing – preser – Process disinfecting – preserving – deodorizing – or sterilizing – Using direct contact with electrical or electromagnetic...
Patent
1995-06-05
1997-07-08
Alexander, Lyle A.
Chemical apparatus and process disinfecting, deodorizing, preser
Process disinfecting, preserving, deodorizing, or sterilizing
Using direct contact with electrical or electromagnetic...
422 23, 422 28, 422 36, 422 37, A61L 200, A61L 214
Patent
active
056457960
ABSTRACT:
A process for plasma sterilization in which articles in a sterilizing chamber are taken through at least one combination sterilizing cycle. The articles to be sterilized may include the interior of a vessel or chamber. In that case, the vessel or chamber itself may serve as a sterilizing chamber and connects to the plasma generating chamber. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposure of the article to a plasma having essentially uncharged, highly reactive free radicals, molecules and atoms.
REFERENCES:
patent: 3383163 (1968-05-01), Menashi
patent: 3410776 (1968-11-01), Bersin
patent: 3428548 (1969-02-01), Hollahan
patent: 3704096 (1972-11-01), Verses et al.
patent: 3737608 (1973-06-01), Nagao et al.
patent: 3851436 (1974-12-01), Fraser et al.
patent: 3948601 (1976-04-01), Fraser et al.
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4123663 (1978-10-01), Horiike
patent: 4138306 (1979-02-01), Niwa
patent: 4151034 (1979-04-01), Yamamoto
patent: 4160690 (1979-07-01), Shibagaki
patent: 4169123 (1979-09-01), Moore et al.
patent: 4169124 (1979-09-01), Forstrom et al.
patent: 4207286 (1980-06-01), Boucher
patent: 4230663 (1980-10-01), Forstrom et al.
patent: 4289728 (1981-09-01), Peel et al.
patent: 4321232 (1982-03-01), Bithell
patent: 4348357 (1982-09-01), Bithell
patent: 4366125 (1982-12-01), Kodera et al.
patent: 4437567 (1984-03-01), Jeng
patent: 4643876 (1987-02-01), Jacobs et al.
patent: 4756882 (1988-07-01), Jacobs et al.
patent: 4801427 (1989-01-01), Jacob
patent: 4818488 (1989-04-01), Jacob
patent: 4898715 (1990-02-01), Jacob
patent: 4917586 (1990-04-01), Jacob
patent: 4931261 (1990-06-01), Jacob
patent: 4943417 (1990-07-01), Jacob
patent: 4976920 (1990-12-01), Jacob
patent: 5302343 (1994-04-01), Jacob
Amsler Thomas J.
Campbell, deceased Bryant A.
Caputo Ross A.
Du Kangyan
Jones Jeffery
Abtox, Inc.
Alexander Lyle A.
LandOfFree
Process for plasma sterilizing with pulsed antimicrobial agent t does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for plasma sterilizing with pulsed antimicrobial agent t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for plasma sterilizing with pulsed antimicrobial agent t will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2407459