Process for improved development of electron-beam-sensitive resi

Details Process for improved development of electron-beam-sensitive resi Process for improved development of electron-beam-sensitive resi

1974-09-16

1976-06-01

Bowers, Jr., Charles L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 35, 96 36, 96 49, 96 91D, 156 13, 156 17, 427335, B05D 306, G03F 102

Patent

active

039611019

ABSTRACT:
The development of an exposed electron beam sensitive resist film in a two-stage process, rather than in a single stage, with a water wash between stages, improves the sensitivity and resolution that can be achieved for the resist.

REFERENCES:
patent: 3264104 (1966-08-01), Reichel
patent: 3482973 (1969-12-01), Amidon
patent: 3615476 (1971-10-01), Cassieus et al.
patent: 3615486 (1971-10-01), Delzenne
patent: 3639185 (1972-02-01), Colom et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3649393 (1972-03-01), Hatzakis
patent: 3674591 (1972-07-01), Boyd
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3770433 (1973-11-01), Bartelt et al.
patent: 3852771 (1974-12-01), Ross et al.
patent: 3859099 (1975-01-01), Petropoulos et al.

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