Rubbing treating apparatus and rubbing treating method including

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

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G02F 11337

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active

058446508

ABSTRACT:
A rubbing treating apparatus, comprising: a stage for mounting thereon an electrode substrate provided with an alignment control film, a rubbing cloth for effecting rubbing treatment by rubbing it against the alignment control film, a rubbing mask mounted on the stage so as to cover at least a part of the electrode substrate, and a holding means for causing at least the rubbing mask to closely contact the stage, wherein the rubbing mask is caused to closely contact the stage at the time of rubbing treatment. The rubbing mask is effective in imparting an alignment control power to the surface of the alignment control film, effecting uniform rubbing treatment with respect to a desired region and preventing an occurrence of alignment defects and a deterioration of the rubbing cloth.

REFERENCES:
patent: 5315421 (1994-05-01), Kurai et al.
patent: 5353141 (1994-10-01), Onuma et al.
patent: 5381256 (1995-01-01), Hanyu et al.
patent: 5406397 (1995-04-01), Kodera et al.
patent: 5422750 (1995-06-01), Kodera et al.
patent: 5455695 (1995-10-01), Kodera et al.

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