Method and apparatus for measuring moisture content in a gas

Measuring and testing – Gas analysis – Moisture content or vapor pressure

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

7333504, 73 3102, 73579, 422 83, G01W 100, G25F 320, G01N 3100, H01C 1300

Patent

active

058441255

ABSTRACT:
A device for measuring moisture concentration in a gas is provided which includes a sensing device capable of producing physical response to an energy input and having at least one surface coated with a metal hydroxide capable of adsorbing moisture. The metal hydroxide is derived from a metal coating on the sensing device.

REFERENCES:
patent: 3523244 (1970-08-01), Goodman et al.
patent: 3642521 (1972-02-01), Moltzan et al.
patent: 4143177 (1979-03-01), Kovac et al.
patent: 4163384 (1979-08-01), Blakemore
patent: 4164868 (1979-08-01), Suntola
patent: 4765870 (1988-08-01), Emmer et al.
patent: 4793182 (1988-12-01), Djorup
patent: 5198094 (1993-03-01), Mettes
patent: 5199295 (1993-04-01), Mettes
patent: 5317274 (1994-05-01), Nakagawa et al.
patent: 5319975 (1994-06-01), Pederson et al.
patent: 5591896 (1997-01-01), Lin
patent: 5616827 (1997-04-01), Simmermon et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for measuring moisture content in a gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for measuring moisture content in a gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring moisture content in a gas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2396866

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.