Stock material or miscellaneous articles – Composite – Of inorganic material
Patent
1986-12-03
1989-04-18
Pianalto, Bernard
Stock material or miscellaneous articles
Composite
Of inorganic material
427 38, 427 531, 427 74, 427 541, 427 99, 4271262, 4271264, 4272552, 4273762, 427380, 4274192, 4274197, 428702, 428704, B32B 900
Patent
active
048226971
ABSTRACT:
This invention relates to materials produced by diluting in a solvent a platinum or rhodium catalyzed preceramic mixture of a hydrogen silsesquioxane resin. The preceramic mixture solvent solution is applied to a substrate and ceramified by heating. One or more ceramic coatings containing silicon carbon, silicon nitrogen, or silicon carbon nitrogen can be applied over the ceramified SiO.sub.2 coating. A CVD or PECVD top coating can be applied for further protection. The invention is particularly useful for coating electronic devices.
REFERENCES:
patent: 4312970 (1981-02-01), Gaul
patent: 4340619 (1981-01-01), Gaul
patent: 4395460 (1981-09-01), Gaul
patent: 4397828 (1983-08-01), Seyferth et al.
patent: 4404153 (1983-09-01), Gaul
patent: 4482669 (1984-11-01), Seyferth et al.
patent: 4482689 (1984-11-01), Haluska
patent: 4535007 (1985-08-01), Cannady
patent: 4540803 (1985-09-01), Cannady
patent: 4543344 (1985-09-01), Cannady
U.S. Ser. No. 835,029, 2/28/1986, Varaprath.
U.S. Ser. No. 926,145, 11/03/1986, Haluska.
U.S. Ser. No. 926,607, 11/04/1986, Haluska.
U.S. Ser. No. 652,939, 9/21/1984, Baney et al.
Gupta & Chin, Characterization of Spin-On Glass Films as a Planarizing Dielectric, 1985, 22, 349-365.
Glaser & Pantano, Effect of the H.sub.2 O/Teos Ratio Upon the Preparation & Nitridation of Silica Sol/Gel Films, 1984, Journal of Non-Crystalline Solids, 63, 209-221.
Frye et al., 1970, JACS 92, 5586.
Haluska Loren A.
Michael Keith W.
Tarhay Leo
Bittell James E.
Dow Corning Corporation
Pianalto Bernard
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