Method of making self-aligned vertical intrinsic resistance

Details Method of making self-aligned vertical intrinsic resistance Method of making self-aligned vertical intrinsic resistance

1991-07-03

1993-01-05

Thomas, Tom

Fishing, trapping, and vermin destroying

437 35, 437 46, 437 48, 437 52, 437 60, 437918, H01L 2170

Patent

active

051770300

ABSTRACT:
A self-aligned vertical intrinsic resistance for use in semiconductor devices is developed. The self-aligned vertical intrinsic resistance may be used in a variety of designs, such as functioning as a pullup device in integrated circuits and more specifically for use as a pullup resistor in SRAM devices. The vertical positioning of the intrinsic resistance not only takes up less die space but also allows for a simple process to construct the resistance by eliminating a photomask step that is normally required prior to implanting an intrinsic resistance used in conventional fabrication processes.

REFERENCES:
patent: 4575923 (1986-03-01), Arnold
patent: 4690728 (1987-09-01), Tsang et al.

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