Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1993-08-05
1995-04-04
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430321, 428203, 428209, 427164, 427595, G03F 900
Patent
active
054036836
ABSTRACT:
A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
REFERENCES:
patent: 4256778 (1981-03-01), Mizukami et al.
patent: 4368230 (1983-01-01), Mizukami et al.
patent: 4440841 (1984-04-01), Tabuchi
patent: 4735890 (1988-04-01), Nakane
Hirokane Junji
Inui Tetsuya
Mieda Michinobu
Nagahara Yoshiyuki
Ohta Kenji
Rosasco S.
Sharp Kabushiki Kaisha
LandOfFree
Photo-mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photo-mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo-mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2379853