Catalysis in organometallic CVD of thin metal films

Details Catalysis in organometallic CVD of thin metal films Catalysis in organometallic CVD of thin metal films

1992-10-13

1995-04-04

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427123, 427124, 4272552, 4272557, 427554, C23C 1600

Patent

active

054036208

ABSTRACT:
A process for CVD including plasma enhanced and laser induced CVD using one or more precursor film forming metal compounds as the major film forming metal precursor, for example organotungsten, which is admixed with minor amounts of a precursor catalytic metal compound, for example, an organoplatinum compound, as a precursor to a catalytic metal in the presence of hydrogen gas to provide improved purity of deposited metal films having residual amounts of the catalytic metal incorporated therein.

REFERENCES:
patent: 3622367 (1971-11-01), Haag
patent: 4915988 (1990-04-01), Erbil
patent: 5091210 (1992-02-01), Mikoshiba
patent: 5130172 (1992-07-01), Hicks
patent: 5154949 (1992-10-01), Shindo
Houle, F. A. et al., "Surface Processes Leading to Carbon Contamination of Photochemically Deposited Copper Films" Nov./Dec. 1986, A4(6)pp. 2452-2458, J. Vac Sci.
Gozum, John E. et al, "Tailored Organometallics as Precursors for the Chem. Vapor Deposition of High-Purity Palladium and Platinum Thin Films", 1988, pp. 2688-2689, J. Am. Chem. Soc vol 110, No. 8 (no month).
Kaplin, Yu A. et al. "Decomposition of Nickelocene in Presence of Hydrogen" Jan. 1980, pp. 118-121, UDC. 547.1' 174, c. 1980, Plenum Publishing Corp., translated from Zharnal Obshchei Khimir, 50, 118 (1980).
Egger, K. W., "Cyclopentadienyl-Metal Complexes II Mass Spectrometric and Gas Phase Kinetic Studies on the Thermal Stability and the Structure of (CH3)3PtC5H5", 24(1970) pp. 501-506, J. Organometallic Chemistry no month.
Miller, Timothy M. et al, "Heterogeneous, Platinum-Catalyzed Hydrogenation of (Diolofin)dialkylplatinum (II)Complexes: Kinetics", 1988, pp. 3146-3156, J. Amer Chem Soc vol 110 #10 no month.

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