Reduced-projection exposure system with chromatic aberration cor

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

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356400, G06K 7015

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active

053249534

ABSTRACT:
A novel exposure system includes a reduced-projection lens optimized for a predetermined single exposure wavelength and a chromatic aberration correction system for TTL (Through The Lens) alignment with broadband light. The correction system includes a holographic lens which dispersion has a negative number in contrast to a conventional glass lens which has a positive dispersion number. By employing a holographic lens, the total optical length of an alignment system can be made short enough to avoid the necessity of installing a mirror therein, thus realizing a highly accurate alignment system.

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Hiroshi Kubota; Optics; 1986; pp. 46-47.
Thomas Stone et al.; Hybrid diffractive-refractive lenses and achromats; Applied Optics; vol. 27; No. 14; Jul. 15, 1988; pp. 2960-2971.
Dean Faklis et al.; Broadband imaging with holographic lenses; Optical Engineering; vol. 28; No. 6; Jun. 1989; pp. 592-598.

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