RIE Apparatus utilizing a shielded magnetron to enhance etching

Details RIE Apparatus utilizing a shielded magnetron to enhance etching RIE Apparatus utilizing a shielded magnetron to enhance etching

1982-07-07

1984-02-14

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 204192E, 204298, C23C 1500

Patent

active

044314736

ABSTRACT:
A dry etching apparatus for semiconductor wafers has a decompression vessel, the inside of which is divided by a separating wall into a discharge room and a shield room. The discharge room has a pair of elecrodes between which RF electric power is applied. One of the electrodes is placed at the separating wall and supports the wafer which is to be etched. A magnet assembly in the shield room generates a magnetic flux in the discharge room which perpendicularly intersects the electric field between the electrodes. A reactive gas is introduced into the discharge room, however, no discharge occurs, because its pressure is maintained below that required for discharge. This results in a reduced consumption of electric power, less heating, and less damage to the resist mask on the wafer.

REFERENCES:
patent: 3981791 (1976-09-01), Rosvold
patent: 4247383 (1981-01-01), Greue et al.
patent: 4313783 (1982-02-01), Davies
patent: 4318767 (1982-03-01), Hijikata
patent: 4324631 (1982-04-01), Meckel et al.
patent: 4340462 (1982-07-01), Koch
patent: 4341582 (1982-07-01), Kohman et al.
patent: 4352974 (1982-10-01), Mizutani et al.
patent: 4367114 (1983-01-01), Steinberg et al.
patent: 4384938 (1983-05-01), Desilets et al.
patent: 4388034 (1983-06-01), Takahashi et al.
Tokuda Seisakusho, Ltd., Reactive Ion Etching System; TRIE-303, Kanagawa-Ken, Japan.

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