Scanning exposure apparatus and method including controlling irr

Details Scanning exposure apparatus and method including controlling irr Scanning exposure apparatus and method including controlling irr

1994-07-26

1996-10-22

Le, Que T.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250216, 355 69, G01J 132

Patent

active

055679285

ABSTRACT:
A scanning type exposure apparatus includes an irradiation source for irradiating an irradiation beam, which has an intensity fluctuation upon a start of irradiation; a scanner for imparting relative movement between the irradiation beam and a mask and a substrate to be exposed to a pattern of the mask, wherein the relative movement starts before a start of illumination of the mask with the irradiation beam; and a controller for controlling the irradiation source to start emission of the irradiation beam before a start of the relative movement and a start of the illumination to reduce intensity fluctuation of the irradiation beam.

REFERENCES:
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patent: 4905041 (1990-02-01), Aketagawa
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 5053614 (1991-10-01), Yui et al.
patent: 5107275 (1992-04-01), Tsuruoka et al.
patent: 5119390 (1992-06-01), Ohmori
patent: 5121160 (1992-06-01), Sano et al.
patent: 5250797 (1993-10-01), Sano et al.

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