Method for creating a digital micromirror device using an alumin

Details Method for creating a digital micromirror device using an alumin Method for creating a digital micromirror device using an alumin

1995-02-27

1996-10-22

Powell, William

Etching a substrate: processes

Forming or treating optical article

216 41, 216 67, 216 77, B44C 122, C23F 100

Patent

active

055673341

ABSTRACT:
A method for fabricating a DMD spatial light modulator (10, 66) using an aluminum hard mask (40,50,80,90). The DMD superstructure (14,16) is comprised entirely of titanium tungsten (TiW), whereby the hinge (14) and beam (16) are patterned by a respective thin aluminum hard mask. A very rigid superstructure (14,16) is achieved, and the use of a sacrificial oxide hard mask is avoided. With the thin aluminum hard mask (40,80), good step coverage of subsequent layers is achieved. Relatively few semiconductor processing steps are required, with the titanium tungsten layers (32,44,72,84) being etched away with a fluorinated plasma. In one embodiment, the photoresist spacer layer (30) is never exposed to a fluorinated plasma.

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