Method and apparatus for wafer chamfer polishing

Abrading – Abrading process – Glass or stone abrading

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

451 57, 451180, 451292, 451 66, B24B 906

Patent

active

055474152

ABSTRACT:
A method and apparatus for polishing chamfers made along the periphery; of a semiconductor wafer designed such that when the wafer is once picked up by a rotatory suction cup of a transportation robot, arm, the wafer is not released from the suction cup until the entire polishing operation is completed; in an embodiment, a circular turn table having six wafer suction cups is employed which is adapted to turn step-wise, each step consisting of a turn through an angle of 60.degree. to transfer the wafers.

REFERENCES:
patent: 5094037 (1992-03-01), Hakomori et al.
patent: 5097630 (1992-03-01), Maeda et al.
patent: 5117590 (1992-06-01), Kudo et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for wafer chamfer polishing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for wafer chamfer polishing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for wafer chamfer polishing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2326963

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.