Etching a substrate: processes – Forming or treating optical article
Patent
1996-01-19
1998-01-06
Powell, William
Etching a substrate: processes
Forming or treating optical article
216 33, 216 66, 216 80, B44C 122, C03C 1500
Patent
active
057050791
ABSTRACT:
Photoetchable glass is used to form spacer elements for large area field emission displays. Frit dots are placed onto a substrate. A sheet of photo etchable glass is exposed to UV light using a mask such that the UV light exposes the etchable areas and does not expose the areas which will form the spacers. The etchable glass is then heat treated to crystallize the UV exposed areas and to tailor the coefficient of thermal expansion. Next the glass is adhered to the frit coated substrate and the UV exposed areas etched away leaving spacers adhered to frit dots.
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Micron Display Technology Inc.
Powell William
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