Method for fabricating high density DRAM reticles

Details Method for fabricating high density DRAM reticles Method for fabricating high density DRAM reticles

1990-06-22

1993-07-13

Golian, Joseph

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

1566591, 156663, 430296, 430321, 430323, G03F 900

Patent

active

052272699

ABSTRACT:
A method of reticle fabrication is disclosed which will reduce e-beam write time by two orders of magnitude for a 64 megabit DRAM. The method involves the mix of using both e-beam and optical lithography on a single reticle.

REFERENCES:
patent: 4448637 (1984-05-01), Hiraishi et al.
patent: 4761303 (1988-08-01), Ruszczyk et al.
patent: 4969200 (1990-11-01), Manns et al.
patent: 4979223 (1990-12-01), Manns et al.
S. M. Sze, VLSI Technology, 2nd Edition, Copyright 1988 pp. 157-160 and 165-167.

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