Exhaust system for chemical vapor deposition apparatus

Gas separation – With nonliquid cleaning means for separating media – Solid agent cleaning member movingly contacts apparatus

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Details

55267, 55282, 118 501, 427 38, B01D 3518

Patent

active

046080635

ABSTRACT:
An exhaust system comprising an exhaust device and a collecting device incorporating a filter and positioned in front of the exhaust device, the exhaust system being adapted for use in a chemical vapor deposition apparatus, wherein at least a part of the collecting device is heated.

REFERENCES:
patent: 1679090 (1928-07-01), Lammert
patent: 2334971 (1943-11-01), Walker
patent: 2415621 (1947-02-01), Arnhym
patent: 3224169 (1965-12-01), Gaylord, Jr.
patent: 3469375 (1969-09-01), Barrington et al.
patent: 3950152 (1976-04-01), Guon
patent: 4347065 (1982-08-01), Gans
patent: 4485622 (1984-12-01), Takagi
patent: 4501766 (1985-02-01), Suzuki et al.

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