Photosensitive materials

Details Photosensitive materials Photosensitive materials

1985-03-12

1986-03-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430154, 430163, 430168, 430302, 430309, 430327, 430494, 430945, 430942, G03F 708, G03C 518

Patent

active

045768927

ABSTRACT:
A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. One method of pretreatment involves preheating the diazo compound to a temperature above about 35.degree. C. up to about 120.degree. C. The improved lithographic plate and the process of preparing plate are claimed.

REFERENCES:
patent: 2908572 (1959-10-01), Schoen
patent: 3144331 (1964-08-01), Thommes et al.
patent: 3598584 (1971-08-01), Rust et al.
patent: 3615442 (1971-10-01), Geris et al.
patent: 3859091 (1975-01-01), Wessells et al.
patent: 4063949 (1980-12-01), Uhlig et al.
patent: 4212935 (1975-01-01), Conavello

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