Multilayer film reflecting mirror for X-rays

Details Multilayer film reflecting mirror for X-rays Multilayer film reflecting mirror for X-rays

1991-10-24

1992-11-10

Hannaher, Constantine

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 43, 378 70, 427160, 428220, 4289122, G21K 106

Patent

active

051630788

ABSTRACT:
An X-ray multilayer film reflecting mirror comprises a plurality of substance layers formed on a substrate to be applied to X-rays having a wavelength of 100 .ANG. or less so that a deviation .DELTA. of the film thickness of each layer from a standard value is within a range defined by ##EQU1## where .theta. is the grazing angle of an X-ray being incident and .lambda. is the wavelength of the X-ray. Thus, the multilayer film reflecting mirror having the reflectance which is advantageous in practical use can be stably provided, and a product yield is improved.

REFERENCES:
patent: 4684565 (1987-08-01), Abeles et al.
patent: 4693933 (1987-09-01), Keem et al.
patent: 4727000 (1988-02-01), Ovshinsky et al.
patent: 4785470 (1988-11-01), Wood et al.
patent: 4916721 (1990-04-01), Carr et al.
T. Namioka, "Current Research Activities in the Field of Multilayers for Soft X-rays in Japan", Revue Phys. Appl. 1988, pp. 1711-1726.
T. Namioka et al. Developments of Light Sources and Optical Systems for Soft X-Ray Lithography, p. 23 4.2 (Japan, 5985007).
H. Yamashita, O plus E, Feb. 1987 pp. 67-83 (p. 67 1).
Sadao Aoki, X-Ray Optical Elements and Their Applications, 1986, pp. 342-350 (p.346 48) 3.2.

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