Method of manufacturing a high resistance layer having a low tem

Details Method of manufacturing a high resistance layer having a low tem Method of manufacturing a high resistance layer having a low tem

1983-04-06

1986-03-18

Roy, Upendra

Metal working

Method of mechanical manufacture

Assembling or joining

148 15, 148187, 357 57, 357 91, 420578, 428641, H01L 21263, H01L 700, H01L 2126

Patent

active

045759235

ABSTRACT:
The present invention provides a high resistance film with a low temperature coefficient of resistance. Such films can be used as resistors in integrated and hybrid circuits, as well as resistive layers in passivating circuits for high-voltage devices. In the latter circuits, the passivating layers shield the device from the detrimental influence of external or internal electric fields. The ability to obtain a low temperature coefficient of resistance enables obtaining a high sheet resistance without being influenced by changing temperatures.

REFERENCES:
patent: 4217601 (1980-08-01), DeKeersmaeker et al.
patent: 4394191 (1983-07-01), Wada et al.
patent: 4411708 (1983-10-01), Winhan
patent: 4431460 (1984-02-01), Barson et al.
patent: 4438556 (1984-03-01), Komatsu et al.
patent: 4467519 (1984-08-01), Glang et al.
patent: 4472210 (1984-09-01), Wu et al.
Lloyd et al., IBM-TDB, 23 (1980) 2811.

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