Method of manufacturing a thin-film electrode

Details Method of manufacturing a thin-film electrode Method of manufacturing a thin-film electrode

1976-06-28

1977-11-08

Kendall, Ralph S.

Coating processes

Electrical product produced

Metal coating

33366, 29570, 29573, 204192F, 427124, 427126, 427250, 427255, 427404, C23C 1302

Patent

active

040576612

ABSTRACT:
A method of manufacturing a thin-film electrode constituting a multi-layer electrode structure supported at an electrically insulating surface of a supporting element, comprising: a first step of depositing a thin-film layer on said surface and, in succession a second step of depositing an additional thin-film layer on top of the previously deposited thin-film layer, said second depositing step being carried out at least once, and the last one of the depositing steps being carried out in a vacuum chamber under reduced pressure of a residual gas.

REFERENCES:
patent: 2719097 (1955-09-01), Auwarter
patent: 3218194 (1965-11-01), Maissel
patent: 3256588 (1966-06-01), Sikina
patent: 3386894 (1968-06-01), Steppat
patent: 3443933 (1969-05-01), Boyhan
patent: 3529350 (1970-09-01), Rairden
patent: 3616406 (1971-10-01), Turner
patent: 3711383 (1973-06-01), Schiekel
patent: 3823486 (1974-07-01), Bhat
patent: 3873944 (1975-03-01), Vaguine
Chopra, Thin Film Phenomena, McGraw-Hill, (1969) p. 31.
Chance et al, IBM Tech. Disclosure Bull., "Ceramic Metalization", vol., No. 12, p. 1835 (1966).

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