Method of manufacturing shadow mask

Details Method of manufacturing shadow mask Method of manufacturing shadow mask

1984-02-24

1986-01-21

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 23, 430320, 430323, 430394, 156640, 1566611, 445 47, G03F 900, B41C 100

Patent

active

045657556

ABSTRACT:
A method of manufacturing a shadow mask comprises the steps of: forming photoresist films on two major surfaces of a sheet made of a shadow mask material; forming latent images by selectively exposing the photoresist films, respectively; developing the latent images to form photoresist film patterns, respectively; and spraying an etching solution for etching the shadow mask sheet having the photoresist film patterns onto the two major surfaces thereof to etch bared portions of the shadow mask sheet, wherein the photoresist film formed on one of the two major surfaces of the shadow mask sheet is thicker than that formed on the other of the two major surfaces. The step of spraying the etching solution comprises a first step and a subsequent second step, wherein an impact of the etching solution against the shadow mask sheet in the first step is greater than that in the second step.

REFERENCES:
patent: 2762149 (1956-09-01), Mears
patent: 3666462 (1972-05-01), Kaplan
patent: 3676914 (1972-07-01), Fiore

Affiliated with

Also associated with

Rating

Method of manufacturing shadow mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing shadow mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing shadow mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2298173