Method of downsizing graphic data of a mask pattern stored in a

Details Method of downsizing graphic data of a mask pattern stored in a Method of downsizing graphic data of a mask pattern stored in a

1996-05-06

1998-03-24

Teska, Kevin J.

Boots, shoes, and leggings

364490, 364489, 364488, G06F 1750

Patent

active

057319863

ABSTRACT:
A method for downsizing graphic data of a mask pattern stored in a hierarchical graphic database so that the mask pattern can be used in fabrication of integrated circuits (ICs) having a reduced feature size. The method includes filling gaps formed between abutting graphic elements with supplementary graphic elements, without disturbing or modifying the overall hierarchical structure for recording and relating all the graphic elements in the mask pattern. Further, the method downsizes the graphic data of a mask pattern without greatly increasing the amount of required data storage in the hierarchical graphic database, which would burden the storage, transmission, and modification capacities of the mask pattern. The method includes the steps of: (1) downsizing the hierarchical graphic database; (2) flattening the downsized hierarchical graphic database; (3) oversizing the flattened hierarchical graphic database; (4) undersizing the oversized hierarchical graphic database; (5) performing a logical-NOT operation on the undersized hierarchical graphic database and the flattened hierarchical graphic database so as to obtain a gap-filling graphic element; and (6) incorporating the gap-filling graphic element in the downsized hierarchical graphic database.

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"Restructuring VLSI Layout Representations for Efficiency", by Nair et al., IEEE European Design Automation Conference, 1991, pp. 111-116.
"Hierarchical Critical Area Extraction with the EYE Tool", by Allan et al., IEEE Defect and Fault Tolerance in VLSI Systems, 1995 Int'l. Workshop, pp. 28-36.

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