Plasma deposition of amorphous metal alloys

Details Plasma deposition of amorphous metal alloys Plasma deposition of amorphous metal alloys

1985-07-18

1986-12-02

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

204164165, B05D 306

Patent

active

046264485

ABSTRACT:
Amorphous metal alloy coatings are plasma-deposited by dissociation of vapors of organometallic compounds and metalloid hydrides in the presence of a reducing gas, using a glow discharge. Tetracarbonylnickel, phosphine, and hydrogen constitute a typical reaction mixture of the invention, yielding a NiPC alloy.

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Lieberman, H. H., "Amorphous Alloy Sample Preparation-Methods and Process Characterization," General Electric Report #82CRD146, May 1982.
Lieberman et al., "Rapid Solidification of Metastable Material," G.E. Report #81CRD327, Jan. 1982.
Wroge, D. M. et al., "Plasma Enhanced Deposition of Iron/Iron Oxide Films," Report 1979, LBL 9879.

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