Photoresist process and photosensitive O-quinone diazide article

Details Photoresist process and photosensitive O-quinone diazide article Photoresist process and photosensitive O-quinone diazide article

1975-01-15

1977-07-19

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 362, 96 49, 96 75, 96 91D, G03C 534, G03C 160

Patent

active

040366448

ABSTRACT:
Carboxylic acids are included in resists to increase their speed and adhesion.

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patent: 3890153 (1975-06-01), Dijkstra
Noller, C. R., "Textbook of Organic Chemistry," 2nd Ed., W. B. Saunders Co., 1951, pp. 111-112.

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