Method of reducing registration error in exposure step of semico

Details Method of reducing registration error in exposure step of semico Method of reducing registration error in exposure step of semico

1996-05-24

1998-03-24

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, 430312, 430313, 430314, 430315, 430316, 356399, 356401, G03F 900

Patent

active

057311137

ABSTRACT:
A method of reducing a registration error is provided in which the registration error can be uniformly distributed even if an amount of displacement is larger than others at only one of a plurality of measuring points. According to the method, amounts of displacement are measured first at a plurality of measuring points, then one half the sum of the maximum value and the minimum value of the measured amounts of displacement is calculated to obtain a correction value. The correction value is fed back to an exposure apparatus as a correction value for an exposure condition setting file within the exposure apparatus used in an exposure step. The registration error can be distributed uniformly even if amounts of displacement at a plurality of measuring points are considerably different from each other.

REFERENCES:
patent: 5444538 (1995-08-01), Pellegrini
patent: 5468580 (1995-11-01), Tanaka
patent: 5656402 (1997-08-01), Kasuga

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