Apparatus and method for washing substrates

Details Apparatus and method for washing substrates Apparatus and method for washing substrates

1996-01-11

1998-03-24

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 82, 134902, 419222, B08B 1300

Patent

active

057301620

ABSTRACT:
A substrate washing apparatus includes a bath, a washing solution supply source, a first path for allowing the washing solution overflowing from the bath, a rinse solution supply source, a second path for passing the rinse solution, a common path communicating with the first and second paths and also with a bottom of the bath, a first valve, a second valve, a discharge path branched from the first path, and a control section, wherein the first valve includes a first body for opening/closing the first path, a third path arranged parallel to the first path and having a diameter smaller than a diameter of the first path, and a second body for opening/closing the third path, so that the first body is opened and the second body is closed, to allow the washing solution to flow into the bath, and on the other hand, the first body is closed, the second body is opened, to allow the rinse solution to flow into the bath, and the washing solution remaining in the first and third paths is discharged together with the rinse solution through the discharge path.

REFERENCES:
patent: 5236515 (1993-08-01), Ueno et al.
patent: 5261431 (1993-11-01), Ueno et al.
patent: 5520744 (1996-05-01), Fujikawa et al.

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