Method for the production of light conductor structures with int

Details Method for the production of light conductor structures with int Method for the production of light conductor structures with int

1977-06-08

1979-01-23

Weiffenbach, Cameron K.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 43, 427100, 427123, 427264, 427265, 427270, 427271, 427272, 427374R, B05D 512

Patent

active

041362128

ABSTRACT:
A method of producing a light conductor structure or controllable coupler having a pair of light conductors embedded in a substrate of an electro-optical material and having electrodes arranged therebetween characterized by applying a layer of polycrystalline silicon on one surface of the substrate; etching away a portion of the layer to form a doping or diffusion mask; applying a layer of diffusion material on the mask and exposed silicon-free portions of the surface; diffusing the diffusion material into the silicon-free portions to form the light conductors; applying a layer of negative acting photo-lacquer on the layer of diffusion material and the conductors; projecting light through the substrate with the remaining portions of the silicon layer acting as a mask to expose the photo-lacquer; developing the layer of photo-lacquer to remove unexposed portions with the remaining portions of the lacquer covering the light conductors; removing the remaining portions of the silicon layer; applying a metal layer on the one surface to form the electrodes; and then removing the photo-lacquer layer with the metal disposed thereon from the light conductors.

REFERENCES:
patent: 3695745 (1972-10-01), Furukawa
patent: 3794536 (1974-02-01), Muska
patent: 3983264 (1976-09-01), Schroen et al.
patent: 3997687 (1976-12-01), Phillips
patent: 4040891 (1977-08-01), Chang et al.
patent: 4056304 (1977-11-01), Phillips

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