Chemistry: electrical current producing apparatus – product – and – Having earth feature
Patent
1995-12-18
1997-09-30
Nuzzolillo, M.
Chemistry: electrical current producing apparatus, product, and
Having earth feature
429 30, H01M 490
Patent
active
056724390
ABSTRACT:
In an electrochemical fuel cell, a sufficient quantity of catalyst, effective for promoting the reaction of reactant supplied to an electrode, is disposed within the volume of the electrode so that a reactant introduced at a first major surface of the electrode is substantially completely reacted upon contacting the second major surface. Crossover of reactant from one electrode to the other electrode through the electrolyte in an electrochemical fuel cell is thereby reduced.
REFERENCES:
patent: 4457987 (1984-07-01), Horiba et al.
patent: 5035962 (1991-07-01), Jensen
patent: 5068161 (1991-11-01), Kerk et al.
patent: 5132193 (1992-07-01), Reddy et al.
patent: 5185218 (1993-02-01), Brokman et al.
patent: 5277946 (1994-01-01), Marchetti et al.
patent: 5316871 (1994-05-01), Swathirajan et al.
patent: 5409785 (1995-04-01), Nakano et al.
patent: 5472799 (1995-12-01), Watanabe
patent: 5501915 (1996-03-01), Hards et al.
Surampudi et al., "Advances in direct oxidation methanol fuel cells", Journal of Power Sources, vol. 47, pp. 377-385 (1994) (month N/A).
Pu et al., "A Methanol Impermeable Proton Conducting Composite Electrolyte System", J. Electrochem. Soc., vol. 142, No. 7, pp. L119-L120 (month N/A) 1995.
Campbell Stephen A.
Colbow Kevin M.
Johnson Mark C.
Wilkinson David P.
Ballard Power Systems Inc.
Nuzzolillo M.
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