Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1976-06-25
1981-03-31
Bowers, Jr, Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430317, 430326, 430330, G03C 154, G03C 500
Patent
active
042594308
ABSTRACT:
A resist composition includes an alkali soluble resin, a light sensitive diazo compound, and a thermally activated free radical initiator. Resist masks are formed from the above composition by providing a layer of resist on a substrate, exposing the layer patternwise to radiation, removing portions of the layer with a developing solution, and heating the remaining portions of the layer at a temperature which activates the initiator and cross-links the resist to improve the physical characteristics of the resist layer and minimize pattern distortion.
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Chemical Abstracts, vol. 71, 1969, #82121t.
Kirk-Othmar, "Encyclopedia of Chemical Technology", vol. 15, 2nd ed., 1968, pp. 188-190.
Kaplan Leon H.
Zimmerman Steven M.
Bowers, Jr Charles L.
International Business Machines - Corporation
McBride James R.
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