Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1987-06-23
1988-04-05
Prunner, Kathleen J.
Gas separation
Means within gas stream for conducting concentrate to collector
55127, 55130, 55143, 55145, 55154, 118723, 427 39, B03C 902
Patent
active
047356332
ABSTRACT:
Vapor phase waste species are removed from effluent gas streams using a plasma extraction reactor comprising a pair of parallel, spaced-apart electrodes. The electrodes are driven under conditions, usually at radio frequency, to induce a glow discharge in the waste species, and the excited species are deposited directly on the electrode surface. By providing a very high ratio of electrode area to reactor volume and waste gas volumetric flow rate, substantially complete removal of the waste species can be effected. The system is particularly useful in removing contaminant species discharged from semiconductor processing operations, such as chemical vapor deposition and plasma etching. The method and system are particularly advantageous in that the vapor phase waste products are converted to a solid phase deposited directly on the electrodes which may then be disposed of.
REFERENCES:
patent: 387286 (1888-08-01), Fewson
patent: 1056026 (1913-03-01), Hoofnagle
patent: 1846365 (1932-02-01), Seipp
patent: 3805492 (1974-04-01), King
patent: 3853512 (1974-12-01), Hayashi
patent: 3948625 (1976-04-01), Schultz
patent: 4422407 (1983-12-01), Bessot et al.
patent: 4472174 (1984-09-01), Chuan
patent: 4483883 (1984-11-01), Nath et al.
patent: 4491606 (1985-01-01), Rosler et al.
patent: 4522674 (1985-06-01), Ninomiya et al.
patent: 4626448 (1986-12-01), Hays
patent: 4664938 (1987-05-01), Walker
patent: 4675089 (1987-06-01), Lory et al.
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