Surface measurement apparatus for detecting crystal defects of w

Details Surface measurement apparatus for detecting crystal defects of w Surface measurement apparatus for detecting crystal defects of w

1999-02-23

2000-12-12

Font, Frank G.

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

3562375, 356381, 356382, 4272481, G01N 2100, G01B 1106, C23C 1600

Patent

active

061606154

ABSTRACT:
A sample is supported flat in high precision by a sample chuck, and is easily mounted and dismounted.
A wafer lifting mechanism is arranged in a position separated from a rotating system of a rotatable wafer chuck, and a wafer is lifted from a supporting surface by moving the wafer lifting mechanism upward to let pins penetrate through through holes of the wafer chuck under a state that the wafer chuck is stopped at a sample mounting-and-dismounting position.

REFERENCES:
patent: 5432607 (1995-07-01), Taubenblatt
patent: 5903342 (1999-05-01), Yatsugake et al.
patent: 5925411 (1999-07-01), Van De Van et al.

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