Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1997-04-08

2000-06-06

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, 355 71, G03B 2742, G03B 2772

Patent

active

060725613

ABSTRACT:
When only a selected area of a mask is being projected onto a photosensitive substrate, a permissible range of positions of the photosensitive substrate along the optical axis of a projection optical system is determined, based on the image curvature aberration and depth of focus of the projection optical system within a range corresponding to the selected area. Accordingly, the pattern in the selected area will be projected onto the photosensitive substrate in a properly focused imaging state. The photosensitive substrate is then positioned within the determined permissible range of positions along the optical axis, and the selected area of the mask is projection-exposed onto the photosensitive substrate.

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patent: 5737063 (1998-04-01), Miyachi
patent: 5742376 (1998-04-01), Makinouchi

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