High frequency bipolar transistor structures

Metal treatment – Stock – Ferrous

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148DIG11, 148DIG145, 357 20, 357 36, 357 68, H01L 2972, H01L 2908

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046546871

ABSTRACT:
Structures which improve the high frequency performance of bipolar discrete or integrated transistors through minimization of base contact size and hence collector-base capacitance (and collector-substrate capacitance, if integrated), are disclosed. The transistor comprises at least one elongate emitter arm and substantially minimum-dimension base contacts positioned one facing each side of each emitter arm at at least a minimum dimension from each emitter arm. A base diffusion area is positioned under and is minimum-dimensionally larger than the outer perimeter of the areas bounded by all of the smallest imaginary triangles each including a base contact and a facing emitter arm. Specific examples are described, namely a so-called "lozenge" structure, for relatively narrow emitters, a "cross" structure for wider emitters, and a "T" structure.

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patent: 4012764 (1977-03-01), Satonaka
patent: 4072979 (1978-02-01), Palara
J. Andeweg & T. H. J. van den Hurk, "A Discussion of the Design & Properties of a High Power Transistor for Single Sideband Applications", IEEE Trans Electron Devices, vol. Ed. 17, Sep. 1970, pp. 714-724.
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Cosand, IEEE IEDM, Dec. 1973, Technical Digest, pp. 35-37.

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