Capacitive mask aligner

Details Capacitive mask aligner Capacitive mask aligner

1983-10-12

1987-03-31

Eisenzopf, Reinhard I.

Electricity: measuring and testing

Conductor identification or location

Inaccessible

148DIG102, 34087037, G01R 2726

Patent

active

046545816

ABSTRACT:
An aligner for aligning a mask and a wafer during photolithography of a semiconductor chip uses detection of the differential capacitance between two sets of conductive fingers on the mask and ridges on the wafer. An A.C. signal is coupled between the ridges and the fingers and the phase or amplitude of the signals is detected. An aligner utilizing multiple groups of ridges and fingers allows rotational alignment or two axis lateral alignment. An aligner having reference ledges to which the mask and the wafer are capacitively coupled allows alignment when the distance between the mask and the wafer is too great to permit meaningful capacitive coupling between the mask and the wafer to occur.

REFERENCES:
patent: 3702467 (1972-11-01), Melnyk
patent: 3938113 (1976-02-01), Dobson et al.
patent: 3984680 (1976-10-01), Smith

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