Chemically amplified positive resist composition, pattern formin

Details Chemically amplified positive resist composition, pattern formin Chemically amplified positive resist composition, pattern formin

1999-04-30

2000-09-05

Truong, Duc

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525191, 525219, 525242, 525312, 5253289, 525391, C08F26106

Patent

active

061144622

ABSTRACT:
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

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