Method of forming metallic and ceramic thin film structures usin

Coating processes – Coating by vapor – gas – or smoke – Metal coating

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427250, 42725523, 42725528, 42725539, 427255391, 427255394, C23C 1600

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active

061139831

ABSTRACT:
A new low temperature method for nanostructured metal and ceramic thin film growth by chemical vapor deposition (CVD) involves the use of a low pressure co-flow diffusion flame reactor to react alkali metal vapor and metal halide vapor to deposit metal, alloy and ceramic films. The reaction chemistry is described by the following general equation:

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Pierson, "Handbook Of Chemical Vapor Deposition (CVD) Principles, Technol and Applications", Noyes Publications pp. 1-7 and 395-396, 1992.

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