Phase shift mask and method for fabricating the same

Details Phase shift mask and method for fabricating the same Phase shift mask and method for fabricating the same

1995-01-19

1996-08-06

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430313, 430314, 430323, 430324, G03F 900

Patent

active

055432549

ABSTRACT:
A phase shift mask and a method for fabrication of a phase shift mask provided with a groove formed by etching to a predetermined depth a portion of a transparent substrate on which an edge portion of a phase shift film pattern directly coated on the transparent substrate is disposed, thereby capable of preventing the phenomenon of an undesirable photoresist film residue being left upon a silicon substrate using a Levenson-type phase shift mask.

REFERENCES:
patent: 5130263 (1992-07-01), Possin et al.
patent: 5276551 (1994-01-01), Nakagawa
patent: 5380609 (1995-01-01), Fujita et al.
patent: 5409789 (1995-04-01), Ito
patent: 5418092 (1995-05-01), Okamoto

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