Design rule checking method and a method of fabricating a phase

Details Design rule checking method and a method of fabricating a phase Design rule checking method and a method of fabricating a phase

1992-12-09

1995-08-15

Boudreau, Leo H.

Image analysis

Applications

Manufacturing or product inspection

324501, 348126, 356394, 364491, G06K 900, G01B 1100

Patent

active

054427142

ABSTRACT:
In a design rule checking method of the invention, pattern data for forming one layer is divided into two types of pattern data for an A layer and a B layer. Then, A rules to be satisfied by the pattern data for the A layer, B rules to be satisfied by the pattern data for the B layer, and AB rules to be satisfied by a combination of the two types of pattern data for the A and B layers are established. Then, based on the established rules, it is checked to see whether the pattern data for the A layer satisfies the A rules, whether the pattern data for the B layer satisfies the B rules and whether the combination of the two types of pattern data for the A and B layers satisfies the AB rules.

REFERENCES:
patent: 4774461 (1988-09-01), Matsui et al.
patent: 5270796 (1993-12-01), Tokui et al.
M. D. Levenson et al., IEEE Transactions on Electron Devices, vol. ED-29, No. 12, pp. 1828-1836, Dec. 1982, "Improving Resolution in Photolithography With A Phase-Shifting Mask".

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