Graft copolymers, process for the preparation thereof and ionizi

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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Details

525309, 525310, 525292, C08L25700, C08L25702

Patent

active

045593892

ABSTRACT:
Solvent-soluble copolymers having a number average molecular weight of about 1,000 to about 1,000,000 and comprising recurring units of the following formulae (I) and (II) (case A) or recurring unit of the following formulae (I), (II) and (III) (case B) or solvent-soluble graft copolymers having a number average molecular weight of about 1,500 to about 2,000,000 and comprising recurring units of the following formulae (I), (II) and/or (II'), and (IV) (case C) or recurring units of the following formulae (I), (II) and/or (II'), (III) and (IV) (case D), said recurring units being combined to form the main alkylene chain, wherein in the cases A and B the amount of the formula (I) unit is about 3 to 60 mol % of the total amount of the whole units, and in the cases C and D the amount of the formula (I) unit is about 5 to 60 mol % of the total amount of the units of formulae (I), (II) and/or (II'), and (IV), and in the cases B and D the amount of the formula (III) unit is about 1 to 40 mol % of the total amount of the whole units, and in the cases C and D the amount of the side chains enclosed in brackets of the formula (IV) unit is at least about 10% by weight of the amount of the main chain, exclusive of the bracketed grafted side chains, of the graft copolymer: ##STR1## wherein each of R.sub.1, R.sub.2 and R.sub.3 represents independently hydrogen, a straight or branched chain alkyl group having 1 to 4 carbon atoms or a halogen; R.sub.4 represents hydrogen or a straight or branched chain alkyl group having 1 to 10 carbon atoms; R.sub.5 represents an alkyl group having 1 to 6 carbon atoms, a phenyl group or a benzyl group; R.sub.6 represents hydrogen or a methyl group; R.sub.7 represents a straight or branched chain alkyl group having 1 to 10 carbon atoms, an aryl group, an aralkyl group or an aminoalkyl group; and n is an integer of 1 to 50. A resist having an excellent sensitivity to ionizing radiations and a high resolution, and also having a high dry etching resistance is provided by using these copolymers and graft copolymers.

REFERENCES:
patent: 3043817 (1962-07-01), Jahn et al.
patent: 3493636 (1970-02-01), Grunin et al.

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