Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1992-06-11
1994-04-19
Dzierzynski, Paul M.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 3700
Patent
active
053048113
ABSTRACT:
A lithography system and a method of using the same, wherein a charged-particle beam is deflected to pass through a selected block of stencil pattern on a stencil mask and thereafter the beam forms an image of the stencil pattern on an objective, the lithography system comprising astigmatism and focus compensation coils disposed on both the upstream and downstream sides of the stencil mask, thereby aberration of the incident beam onto the stencil mask being corrected by the astigmatism and focus compensation coils disposed on the upstream side forming a sharp image on the mask, and further aberration of the mask-penetrated beam on the downstream side being corrected by the astigmatism and focus compensation coils disposed on the downstream side forming a sharp image of the stencil pattern on the objective.
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Abe Tomohiko
Oae Yoshihisa
Yamada Akio
Yamazaki Satoru
Dzierzynski Paul M.
Fujitsu Ltd.
Nguyen Kiet T.
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