In-situ dendritic treatment of electrodeposited foil

Details In-situ dendritic treatment of electrodeposited foil In-situ dendritic treatment of electrodeposited foil

1986-12-22

1987-09-08

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

204216, C25D 104

Patent

active

046922210

ABSTRACT:
The present invention relates to a process and apparatus for forming in situ surface treated metal foil. The apparatus includes a cathode and anode arranged and/or shaped to define a plating region characterized by a first zone having a first interelectrode gap and a second zone having a second interelectrode gap smaller than the first interelectrode gap. It has been found that by providing such an arrangement it is possible to generate in the first zone a localized current density below the limiting current density sufficient to plate metal foil onto the cathode and to simultaneously generate in the second zone a localized current density above the limiting current density sufficient to form dendrites on the freshly produced foil.

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