Method for quantitatively determining the shape of small size pr

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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356382, G01N 2186

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active

048354023

ABSTRACT:
A method for quantitatively determining the shape of a pattern in a layer formed on a substrate comprising several steps is disclosed. The method includes acquiring by means of an optical microscope an image i(X) of said object, the focussing being made at an arbitrary height, calculating through a Fourier transform the frequency spectrum I(X) corresponding to the image, calculating a model M(X) corresponding to an object having a width L, to an optical microscope having characteristic functions T(X) and P(X), and to parameters a and b characterizing the reflective power of the object with respect to the substrate according to the formula:

REFERENCES:
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M. E. Guillaume "Fourier Transform Method for Optical Linewidth Measurement", SPIE vol. 80 (1984) pp. 71-77.
M. E. Guillaume, "Accurate Image Modeling for Submicron CD Optical Control." Microelectronic Engineering 6 (1987), pp. 631-636.
M. E. Guillaume, et al.: "Evaluation of a Fourier Transform Method for Accurate Critical Dimension Measurements," Microelectronic Engineering, vol. 3, No. 1/4, Dec. 1985, pp. 211-218.
R. T. Gallagher: "IC Testing: A New Way to Measure Submicron Line Widths," Electronics, vol. 59, No. 8, Feb. 1986, pp. 22, 23.

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