Dual plasma microwave apparatus and method for treating a surfac

Coating apparatus – With vacuum or fluid pressure chamber – With means to apply electrical and/or radiant energy to work...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118723, 118730, 427 39, 427 41, 427 47, C23C 1400, B05D 306

Patent

active

046916628

ABSTRACT:
A plasma apparatus which generates a radio frequency (UHF or microwave) disk plasma 16 and a hybrid plasma 45 derived from the disk plasma. The microwave plasma acts as a source of excited ion and free radical species and electrons for the second plasma which is hybrid in that it contains species from both microwave and dc (or rf depending on bias) excitation. The hybrid plasma can be used to treat an article 43 with different species than are present in the disk plasma and provides more control in this regard than a single plasma.

REFERENCES:
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4511593 (1985-04-01), Brandolf
patent: 4512867 (1985-04-01), Andreev et al.
patent: 4514437 (1985-04-01), Nath

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dual plasma microwave apparatus and method for treating a surfac does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual plasma microwave apparatus and method for treating a surfac, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual plasma microwave apparatus and method for treating a surfac will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2152731

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.