Process for titanium nitride deposition using five-and six-coord

Details Process for titanium nitride deposition using five-and six-coord Process for titanium nitride deposition using five-and six-coord

1996-02-09

1997-03-04

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

4272552, 427590, C23C 1634

Patent

active

056077220

ABSTRACT:
A method is provided for forming films comprising TiN or Ti--Si--N employing the techniques of chemical vapor deposition to decompose a vapor comprising a compound of the formula Ti[N(R.sup.1)(R.sup.2)].sub.x [(R.sup.3)N--C(R.sup.4)(R.sup.5)--C(R.sup.6)(R.sup.7)--N(R.sup.8)(R.sup.9) ].sub.y wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.8 and R.sup.9 are (C.sub.1 -C.sub.4) alkyl, each of R.sup.4, R.sup.5, R.sup.6, and R.sup.7 are each H or (C.sub.1 -C.sub.4) alkyl and x and y are 1-3; so as to deposit a film comprising titanium on the surface of a substrate.

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