Buried layer in a semiconductor formed by bonding

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

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257 98, 257618, 257622, 257623, 257624, H01L 3100, H01L 2906

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active

059776048

ABSTRACT:
Buried layers are formed within a semiconductor. Metallic or insulating buried layers are produced several microns within a semiconductor substrate. The buried layer can confine current to the buried layer itself by using a conductive material to create the buried layer. The buried layer can also confine current to a specified area of the semiconductor, by using an insulating material inside of the buried layer or by leaving a created void within the material. The buried layer is useful in the construction of a semiconductor Vertical Cavity Laser (VCL). A buried isolation layer confines the current to a narrow active region increasing efficiency of the VCL. The buried layer is also useful in fabricating discrete devices, such as diodes, transistors, and photodetectors, as well as fabricating integrated circuits.

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Double-fused long-wavelength vertical-cavity lasers, by Dubravko Ivan Babic, Ph.D. Dissertation, ECE Technical Report #95-20, Aug. 1995, University of California at Santa Barbara, California 93106.

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